22 May14:33pm
Nanbiosis
• Laser Lithography (Mask Plotter)
•- Optical autofocus using 4 mm write head.
•- Minimum feature size: 1.0 µm (200 nm pixel size, 5.7 mm2/min writing speed).
•- Expose small parts samples up through 8” wafers, including masks blanks for photomask fabrication.
•- Diode laser: 405 nm wavelength, 50 mW max. power.
•- Back to front side alignment (alignment accuracy: 250 nm).
•- Grayscale exposure for 3D structures.
•- Stability of the system ensured by a climate chamber that provides constant temperature (±0.1°C).
•- Equipped with an interferometer stage for maximum alignment accuracy.
•- The conversion software accepts standard CAD formats: CIF, DXF and GDSII.